Media Alert: Atomera to Present Keynote Speech at IEEE IMFEDK 2022 Conference
November 15 2022 - 9:00AM
Business Wire
Atomera Incorporated:
WHO:
Hideki Takeuchi of Atomera
Incorporated (Nasdaq: ATOM), a semiconductor materials and
technology licensing company
WHAT:
Both in-person and virtual
presentation of Atomera’s paper, entitled “Remote control of doping
profile, silicon interface, and gate dielectric reliability via
oxygen insertion into silicon channel.”
WHEN:
Live:
Virtual:
Wednesday, November 30 at
4:40-5:20 p.m. JST / 2:40-3:20 a.m. EST
Wednesday, November 30 at
4:40-5:20 p.m. JST / 2:40-3:20 a.m. EST
WHERE:
Avanti Kyoto Hall
Avanti 9th Floor Ryukoku
University
31 Higashikujo Nishisannocho,
Minami Ward,
Kyoto, 601-8003, Japan
Registration Form to attend
virtually
Insertion of Atomera’s MST® film (also referred to as oxygen
insertion or “OI”) into a silicon channel has already been
demonstrated to be effective in enabling precise dopant profile
control, NBTI improvement, carrier mobility improvement and gate
leakage reduction of poly-Si/SiON and HKMG stack, providing
benefits of performance enhancement of power devices, SRAM Vmin
reduction, extension of planar devices, and PTS (punch-through
stop) layer for bulk FinFET devices. This presentation will provide
basic physics behind the improvement through theoretical
calculations and experimental results. Modification of the
formation enthalpy of various dopants and point defects enables
remote control of doping profiles away from the inserted film via
interstitial trapping. 18O tracer experiments revealed dynamic
behaviors of oxygen exchange among OI layers and between OI layers
and gate oxide. This dynamic nature of oxygen provides MST films
with various benefits such as thermal stability sufficient for CMOS
processing, a 35% improvement of surface roughness scattering rate
of inversion electrons, as well as a 6X improvement of charge-to
breakdown of thin-gate dielectrics. Atomera’s paper will dive into
the significant impact for HKMG stack as the MST layers reduce
intermixing and interfacial charge dipoles, which lowers remote
charge scattering and provides viable knobs for the performance
boost and new designs of future electronic devices.
Follow Atomera:
Company website: https://atomera.com/
Atomera whitepaper: https://atomera.com/news-and-blogs/
Atomera blog: https://atomera.com/news-and-blogs/
LinkedIn: www.linkedin.com/company/atomera/
About Atomera
Atomera Incorporated, one of America’s Top 100 Best Small
Companies in 2022 ranked by Forbes, is a semiconductor materials
and technology licensing company focused on deploying its
proprietary, silicon-proven technology into the semiconductor
industry. Atomera has developed Mears Silicon Technology™ (MST®),
which increases performance and power efficiency in semiconductor
transistors. MST can be implemented using equipment already
deployed in semiconductor manufacturing facilities and is
complementary to other nano-scaling technologies in the
semiconductor industry roadmap. More information can be found at
www.atomera.com.
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version on businesswire.com: https://www.businesswire.com/news/home/20221115005730/en/
Justin Gillespie The Hoffman Agency (925) 719-1097
jgillespie@hoffman.com
Jeff Lewis Senior VP Marketing and Business Development, Atomera
(408) 442-5248 jlewis@atomera.com
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